Loading...
Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition
Whittaker, Jed D. Brink, Markus Husseini, Ghaleb Linford, Matthew R. Davis, Robert C.
Whittaker, Jed D.
Brink, Markus
Husseini, Ghaleb
Linford, Matthew R.
Davis, Robert C.
Date
2003
Advisor
Type
Peer-Reviewed
Article
Published version
Article
Published version
Degree
Citations
Altmetric:
Files
Description
Abstract
A self-aligned thin-film deposition technique was developed to mechanically attach carbon nanotubes to surfaces for the fabrication of structurally robust nanotube-based nanomechanical devices. Single-walled carbon nanotubes were grown by thermal chemical-vapor deposition (CVD) across 150-nm-wide SiO2 trenches. The nanotubes were mechanically attached to the trench tops by selective silicon tetraacetate-based SiO2 CVD. No film was deposited on the nanotubes where they were suspended across the trenches.