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Self-aligned mechanical attachment of carbon nanotubes to silicon dioxide structures by selective silicon dioxide chemical-vapor deposition

Whittaker, Jed D.
Brink, Markus
Husseini, Ghaleb
Linford, Matthew R.
Davis, Robert C.
Date
2003
Advisor
Type
Peer-Reviewed
Article
Published version
Degree
Description
Abstract
A self-aligned thin-film deposition technique was developed to mechanically attach carbon nanotubes to surfaces for the fabrication of structurally robust nanotube-based nanomechanical devices. Single-walled carbon nanotubes were grown by thermal chemical-vapor deposition (CVD) across 150-nm-wide SiO2 trenches. The nanotubes were mechanically attached to the trench tops by selective silicon tetraacetate-based SiO2 CVD. No film was deposited on the nanotubes where they were suspended across the trenches.