Husseini, GhalebLinford, Matthew R.Asplund, Matthew C.Peacock, Justin G.Sevy, Eric T.2021-03-042021-03-042002Husseini, G. A., Linford, M. R., Asplund, M. C., Peacock, J., & Sevy, E. T. (2001). Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated 3-Glycidoxypropyldimethylethoxysilane Analyzed by XPS. Surface Science Spectra, 8(4), 291-296. https://doi.org/10.1116/11.200205041055-5269http://hdl.handle.net/11073/21332Silane monolayers on silica, prepared from mono-, di-, and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di- and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon reaction with water. Typically, an organic solvent is used when depositing a silane monolayer. Here we show XPS spectra of monolayers of 3-glycidoxypropyldimethylethoxysilane (CAS# 17963-04-1) on silicon oxide (silicon wafer) prepared using a rapid, solvent-free approach. Reaction conditions are 100 °C for 10 min using the neat (pure) compound, and no inert atmosphere or special treatment of the compound is required.en-USX-ray photoelectron spectroscopySilaneAlkylationMonochlorosilanesPeer-Reviewed10.1116/11.20020504