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Alkyl Monolayers on Silica Surfaces Prepared from Neat, Heated ClSi(CH₃)₂(CH₂)₁₇CH₃ Analyzed by XPS
Husseini, Ghaleb Zilch, Lloyd W. Sevy, Eric T. Asplund, Matthew C. Linford, Matthew R.
Husseini, Ghaleb
Zilch, Lloyd W.
Sevy, Eric T.
Asplund, Matthew C.
Linford, Matthew R.
Date
2002
Advisor
Type
Peer-Reviewed
Article
Published version
Article
Published version
Degree
Description
Abstract
Silane monolayers on silica, prepared from mono-, di- and trichlorosilanes, are widely used in industry for surface functionalization and modification. However, unlike di- and trichlorosilanes, monochlorosilanes are particularly easy to work with because they can dimerize, but not polymerize, upon reaction with water. Typically, an organic solvent is used when depositing a silane monolayer. Here we show XPS spectra of monolayers of ClSi(CH₃)₂(CH₂)₁₇CH₃ (octadecyldimethylchlorosilane, CAS# 18643-08-8) on silicon oxide (silicon wafer) prepared using a rapid, solvent-free approach. Reaction conditions are 120 °C for 10 min using the neat (pure) compound, and no inert atmosphere or special treatment of the compound is required.